Tantalum (Ta) 3N5 (99.95%) Categories: All Evaporation Materials Aluminum (Al) 5N (99.999%) Cobalt (Co) 3N5 (99.95%) Copper (Cu) 5N (99.999%) Chromium (Cr) 3N5 (99.95%) Indium (In) 6N (99.9999%) Molybdenum (Mo) 3N5 (99.95%) Niobium (Nb) 4N (99.99%) Nickel (Ni) 5N (99.999%) Ruthenium (Ru) 3N7 (99.97%) Tin (Sn) 5N (99.999%) Tantalum (Ta) 3N5 (99.95%) Titanium (Ti) 4N (99.99%) Vanadium (V) 3N (99.9%) Sputtering Targets Aluminium (Al) 5N (99.999%) Cobalt (Co) 3N5 (99.95%) Copper (Cu) 4N5 (99.995%) Magnesium Oxide (MgO) 3N5 (99.95%) Niobium (Nb) 4N (99.99%) Nickel (Ni) 4N5 (99.995%) Silicon (Si) 5N (99.999%) Tantalum (Ta) 3N5 (99.95%) Titanium (Ti) 4N5 (99.995%) Substrates & Wafers KTaO3 substrates SrTiO3 substrates All / Sputtering Targets / Tantalum (Ta) 3N5 (99.95%) All Evaporation Materials Sputtering Targets Aluminium (Al) 5N (99.999%) Cobalt (Co) 3N5 (99.95%) Copper (Cu) 4N5 (99.995%) Magnesium Oxide (MgO) 3N5 (99.95%) Niobium (Nb) 4N (99.99%) Nickel (Ni) 4N5 (99.995%) Silicon (Si) 5N (99.999%) Tantalum (Ta) 3N5 (99.95%) Titanium (Ti) 4N5 (99.995%) Substrates & Wafers Tantalum (Ta) 3N5 (99.95%) Sputtering Target, 2" dia x 0.25" thick $400.00
